| S.No | Name of the Instrument | Make/Model | Specifications/mode | Instrument location |
|---|---|---|---|---|
| 1 | X-Ray Diffractometer (XRD) | Panalytical X’ pert pro |
Powder and Thin Film | Hi-Tech Block, Room No:H-402 |
| 2 | Atomic Force Microscopy (AFM) | Park Systems Corporation, XE7 |
Contact/Non-contact / tapping/ MFM(int/ext)/EFM/KPFM/STM/PFM |
|
| 3 | Scanning Electron Microscopy (SEM) | SEC Global PVT Ltd, SNE-3200M |
Resolution ~ 15 nm, 1-30kV, Mag: 60kX |
|
| 4 | Energy dispersive X ray spectroscopy | Bruker, XFlash Detector 610M | Elemental quantification and mapping | |
| 5 | X-Ray Fluorescence Spectrometry (XRF) | PANalytical, Minipal 4 | All elements with atomic no 11-91 (excluding H,N,O,C) |
|
| 6 | UV-Visible Spectrometer | LabIndia, UV 3000+ | Liquid mode | |
| 7 | Fourier transform infrared spectrometer (FTIR) | Bruker, Alpha-T | Solid/Liquid-pH 7 | |
| 8 | Hall Effect | Ecopia, HMS 5300 | Electrical transport properties: 80-350K | |
| 9 | Stylus Profiler | KLA – Tencor,Alpha- Step D-500 | Thickness: few nm to 1200 micrometerForce range: 0.03-15mg | |
| 10 | Atomic absorption spectroscopy | LabIndia, AAS7000 | Available standards-Au, Cr, Co, Cu, Ni, Zn | |
| 11 | Nuclear Magnetic Resonance Spectrometry | Bruker optics,MQ-System 20 | (Direct-digital generation)2-65 MHz with 1 Hz stepping and better than 1 ppm resolution |
|
| 12 | Solar Simulator | Sciencetech, Class A Solar simulator | Thin films and Dye sensitized solar cell | |
| 13 | Laser Flash Analyser (LFA): Thermal Conductivity Measurement System | NETZSCH, Technologies P Ltd,467HT | Materials: Metal and Semiconductors Temp range: 30 -700 oC Pellet samples only |
Hi-Tech Block, Room No: H108 |
| 14 | Seebeck Coefficient and Electrical resistivity Measurement System | ADVANCE RIKO,ZEM-3M8 | Materials: Metal and Semiconductors Temp range: 30 - 700 oC |
|
| 15 | UV-Vis Spectrophotometer with DRS system | JASCO, ANATEK Services, V-750 | Wavelength range 200 to 800 nm | |
| 16 | Spray Pyrolysis Unit | Holmarc Opto-Mechatronics P Ltd, HO-TH-04 |
Substrate temp: 500° C (Max) Substrate area: 150 x 150 mm |
Hi-Tech Block, Room No: H101 |
| 17 | Hot Press Unit | Vacuum Lab Technologies, Bangalore | Temperature 350 to 900 oC | |
| 18 | MicroRaman Spectrometer | HORIBA, LabRam HR Evolution | Laser wavelengths: 325, 532, 633 and 785 nm Resolution: 0.4 cm-1 (@532 nm) |
Sir C. V. Raman Research Park, Room No: RRP006 |
| 19 | Advanced Dual Chamber Sputtering System | Advanced Process Technology Pvt. Ltd. Pune | Dedicated chambers for Nitride and oxide thin films. RF - 2Nos, Pulsed DCV – 1No | Sir C. V. Raman Research Park, Room No: RRP613 |
| 20 | UV-Vis-NIR Spectrophotometer | Agilent, Cary 5000 | Wavelength: 175 – 3300 nm | Sir C. V. Raman Research Park, Room No: RRP205 |
| 21 | Probe Station | Lakeshore, PS100 | Electrical measurements of devices Four independent manipulators |
|
| 22 | Semiconductor Parameter Analyzer | KEITHLEY 4200-SCS | I-V, C-V and pulsed I-V measurements, p-n junction (diode) and transistor testing |
|
| 23 | Battery Tester | Neware, USA | GCD,Cyclic life, Rate capability, PITT,GITT | Hi-Tech Block, Room No:H403 |
| 24 | Electrochemical workstation | Origalys, France | Voltammety,Impedance, corrosion,etc., |